KRI 霍爾離子源 eH

1978 年 Dr. Kaufman 博士在美國創立 Kaufman & Robinson, Inc 公司, 研發生產考夫曼離子源, 霍爾離子源和射頻離子源. 美國考夫曼離子源歷經 40 年改良及發展已取得多項專利. 離子源廣泛用於離子清洗 PC, 離子蝕刻 IBE, 輔助鍍膜 IBAD, 離子濺射鍍膜 IBSD 領域, 伯東公司是美國考夫曼離子源大中華地區總代理.
KRI 考夫曼離子源
            霍爾離子源                               射頻離子源                        考夫曼離子源                                   自動控制器  

eH 400

KRI Ion Source eH 400

Model

eH 400, eH 400 LEHO

Cathode / Neutralizer

Yes

Anode module

Yes

Process gases

Inert, reactive, organic

Power controller

eH Plasma Power Pack

eH 1020 F

KRI Ion Source eH 1020 F

Model

eH 1000 L, eH 1000, eH 1010, eH 1020, eH 1000 x O2, eH 1000 LEHO

Cathode / Neutralizer

Yes

Anode module

Yes

Process gases

Inert, reactive, organic

Power controller

eH Plasma Power Pack

eH 2000

KRI Ion Source eH 2000

Model

eH 2000 L, eH 2000, eH 2000 x O2, eH 2000 LEHO

Cathode / Neutralizer

Yes

Anode module

Yes

Process gases

Inert, reactive, organic

Power controller

eH Plasma Power Pack

eH Linear

KRI Ion Source eH Linear

Model

eHL 200-3, eHL 200-5, eHL 200-7

Height (nominal)

2.9 (7.4cm)

Width (nominal)

3.3 (8.4cm)

Length (nominal)

Determined by number of modules & application

Cathode/Neutralizer

Yes

離子源 eH 200

離子源 eH 200

Model

eH 200, eH 200 LEHO

Cathode / Neutralizer

Yes

Anode module

Yes

Process gases

Inert, reactive, organic

Power controller

eH Plasma Power Pack

 

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