KRI 考夫曼離子源
伯東公司 主要經營產品 伯東國際通商股份有限公司為美國考夫曼公司離子源 Kuafman & Robinson,Inc 總代理. KRI 考夫曼離子源是由離子源發明人Dr.Kaufman 於1978年於美國所創立. KRI 考夫曼離子源歷經30年之改良及研發並取得多項專利, 目前已受各領域肯定.
KRI 考夫曼離子源之high ion bean current及high anode voltage, 加上有效面積廣大, EH1010F , EH1020F…係列, 在於鍍膜之前處理( ISSP)及助鍍(IABD)更有助於提高成膜之沉澱速率, 附著度, 可靠度, 增加折射率, 穿透率...KRI 考夫曼離子源整體設計有著低耗材成本, 安裝簡易, 維護簡單, 無論是在量產單位或是研發單位更是備受肯定及廣泛使用.
KRI 考夫曼離子源簡介
KRI 考夫曼離子源簡介之high ion bean current及high anode voltage, 加上有效面積廣大, EH1010F , EH1020F…係列, 在於鍍膜之前處理( ISSP)及助鍍(IABD)更有助於提高成膜之沉澱速率, 附著度, 可靠度, 增加折射率, 穿透率...KRI 考夫曼離子源整體設計有著低耗材成本, 安裝簡易, 維護簡單, 無論是在量產單位或是研發單位更是備受肯定及廣泛使用.
Power Supply and Control
KRI Ion Source Power Supply and Control
|
Model |
AC Power Controllers |
DC Power Controllers |
RF Power Controllers |
Gas Controllers |
Automated System Controllers |
|---|---|---|---|---|---|
|
|
FC1000 |
DC150-x |
RF1000 |
GC1000 |
AC1000 |
|
|
FC1006 |
DC300-x |
RF1500 |
|
AC1000C |
|
|
|
DC800-x |
|
|
|
|
|
|
DC1000-x |
|
|
|
離子源 eH 200
離子源 eH 200
|
Model |
eH 200, eH 200 LEHO |
|---|---|
|
Cathode / Neutralizer |
Yes |
|
Anode module |
Yes |
|
Process gases |
Inert, reactive, organic |
|
Power controller |
eH Plasma Power Pack |
eH 400
KRI Ion Source eH 400
|
Model |
eH 400, eH 400 LEHO |
|---|---|
|
Cathode / Neutralizer |
Yes |
|
Anode module |
Yes |
|
Process gases |
Inert, reactive, organic |
|
Power controller |
eH Plasma Power Pack |
eH 1020 F
KRI Ion Source eH 1020 F
|
Model |
eH 1000 L, eH 1000, eH 1010, eH 1020, eH 1000 x O2, eH 1000 LEHO |
|---|---|
|
Cathode / Neutralizer |
Yes |
|
Anode module |
Yes |
|
Process gases |
Inert, reactive, organic |
|
Power controller |
eH Plasma Power Pack |
eH 2000
KRI Ion Source eH 2000
|
Model |
eH 2000 L, eH 2000, eH 2000 x O2, eH 2000 LEHO |
|---|---|
|
Cathode / Neutralizer |
Yes |
|
Anode module |
Yes |
|
Process gases |
Inert, reactive, organic |
|
Power controller |
eH Plasma Power Pack |
eH Linear
KRI Ion Source eH Linear
|
Model |
eHL 200-3, eHL 200-5, eHL 200-7 |
|---|---|
|
Height (nominal) |
2.9＂ (7.4cm) |
|
Width (nominal) |
3.3＂ (8.4cm) |
|
Length (nominal) |
Determined by number of modules & application |
|
Cathode/Neutralizer |
Yes |
RPICP 140
KRI Ion Source RPICP 140
|
Model |
RFICP 140 |
|---|---|
|
Discharge |
RF inductive |
|
Filamentless |
Yes |
|
RF power |
>0.5 kW |
|
Ion optics |
OptiBeamTM |
RPICP 200
KRI Ion Source RPICP 200
|
Model |
RFICP 200 |
|---|---|
|
Discharge |
RF inductive |
|
Filamentless |
Yes |
|
RF power |
>0.5 kW |
|
Ion optics |
OptiBeamTM |
RFICP 200 HO
KRI Ion Source RFICP 200 HO
|
Model |
RFICP 200 HO |
|---|---|
|
Discharge |
RF inductive |
|
Filamentless |
Yes |
|
RF power |
>1 kW |
|
Ion optics |
OptiBeamTM |